CVD Equipment (NASDAQ:CVV) Shares Pass Above 200-Day Moving Average – Here’s Why

CVD Equipment Corporation (NASDAQ:CVV)’s share price passed above its two hundred day moving average during trading on Tuesday . The stock has a two hundred day moving average of $3.39 and traded as high as $4.84. CVD Equipment shares last traded at $4.27, with a volume of 90,206 shares changing hands.

Analyst Ratings Changes

Separately, Weiss Ratings reissued a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, October 8th. One research analyst has rated the stock with a Sell rating, According to data from MarketBeat, CVD Equipment currently has an average rating of “Sell”.

CVD Equipment Price Performance

The stock has a market cap of $29.62 million, a price-to-earnings ratio of -213.39 and a beta of 0.89. The stock has a fifty day moving average of $3.37 and a 200 day moving average of $3.39.

CVD Equipment (NASDAQ:CVV) last issued its quarterly earnings results on Monday, November 10th. The industrial products company reported $0.06 earnings per share for the quarter. CVD Equipment had a negative net margin of 0.66% and a negative return on equity of 0.72%. The company had revenue of $7.41 million for the quarter.

Institutional Inflows and Outflows

A hedge fund recently raised its stake in CVD Equipment stock. Citadel Advisors LLC boosted its stake in shares of CVD Equipment Corporation (NASDAQ:CVV) by 93.6% during the 3rd quarter, according to its most recent filing with the SEC. The firm owned 41,382 shares of the industrial products company’s stock after purchasing an additional 20,011 shares during the period. Citadel Advisors LLC owned approximately 0.60% of CVD Equipment worth $139,000 at the end of the most recent quarter. Institutional investors and hedge funds own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.