CVD Equipment (NASDAQ:CVV) Stock Price Passes Above 200-Day Moving Average – Time to Sell?

CVD Equipment Corporation (NASDAQ:CVV) passed above its 200-day moving average during trading on Wednesday . The stock has a 200-day moving average of $3.51 and traded as high as $5.82. CVD Equipment shares last traded at $5.27, with a volume of 68,402 shares traded.

Analyst Upgrades and Downgrades

Separately, Weiss Ratings reissued a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, January 21st. One equities research analyst has rated the stock with a Sell rating, According to MarketBeat.com, CVD Equipment currently has a consensus rating of “Sell”.

CVD Equipment Price Performance

The stock has a 50-day moving average price of $3.66 and a 200-day moving average price of $3.51. The firm has a market capitalization of $36.57 million, a PE ratio of -263.37 and a beta of 0.89.

CVD Equipment (NASDAQ:CVV) last posted its quarterly earnings data on Monday, November 10th. The industrial products company reported $0.06 earnings per share (EPS) for the quarter. CVD Equipment had a negative return on equity of 0.72% and a negative net margin of 0.66%.The company had revenue of $7.41 million for the quarter.

Institutional Trading of CVD Equipment

An institutional investor recently raised its position in CVD Equipment stock. Citadel Advisors LLC raised its stake in shares of CVD Equipment Corporation (NASDAQ:CVV) by 93.6% during the third quarter, according to its most recent filing with the Securities and Exchange Commission (SEC). The fund owned 41,382 shares of the industrial products company’s stock after acquiring an additional 20,011 shares during the quarter. Citadel Advisors LLC owned approximately 0.60% of CVD Equipment worth $139,000 at the end of the most recent quarter. Institutional investors and hedge funds own 31.59% of the company’s stock.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.