CVD Equipment (NASDAQ:CVV) Shares Pass Above Two Hundred Day Moving Average – Here’s What Happened

CVD Equipment Corporation (NASDAQ:CVV)’s stock price crossed above its 200-day moving average during trading on Friday . The stock has a 200-day moving average of $3.56 and traded as high as $4.20. CVD Equipment shares last traded at $4.11, with a volume of 82,525 shares traded.

Wall Street Analysts Forecast Growth

Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a research report on Wednesday, January 21st. One investment analyst has rated the stock with a Sell rating, According to MarketBeat, the company has an average rating of “Sell”.

CVD Equipment Price Performance

The stock’s fifty day moving average is $3.83 and its 200-day moving average is $3.56. The stock has a market cap of $28.52 million, a PE ratio of -205.40 and a beta of 0.97.

CVD Equipment (NASDAQ:CVV) last issued its quarterly earnings data on Monday, November 10th. The industrial products company reported $0.06 earnings per share for the quarter. CVD Equipment had a negative return on equity of 0.72% and a negative net margin of 0.66%.The company had revenue of $7.41 million during the quarter.

Institutional Trading of CVD Equipment

An institutional investor recently raised its position in CVD Equipment stock. Citadel Advisors LLC grew its position in CVD Equipment Corporation (NASDAQ:CVV) by 93.6% in the third quarter, according to its most recent Form 13F filing with the Securities and Exchange Commission. The institutional investor owned 41,382 shares of the industrial products company’s stock after buying an additional 20,011 shares during the quarter. Citadel Advisors LLC owned 0.60% of CVD Equipment worth $139,000 as of its most recent filing with the Securities and Exchange Commission. Institutional investors and hedge funds own 31.59% of the company’s stock.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.