CVD Equipment (NASDAQ:CVV) Stock Price Crosses Above 200 Day Moving Average – Here’s What Happened

CVD Equipment Corporation (NASDAQ:CVV) passed above its 200-day moving average during trading on Tuesday . The stock has a 200-day moving average of $3.58 and traded as high as $3.98. CVD Equipment shares last traded at $3.93, with a volume of 35,180 shares changing hands.

Analyst Ratings Changes

Separately, Weiss Ratings reaffirmed a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the company has a consensus rating of “Sell”.

CVD Equipment Price Performance

The company’s 50-day moving average price is $4.01 and its two-hundred day moving average price is $3.58. The company has a market capitalization of $27.27 million, a price-to-earnings ratio of -196.40 and a beta of 0.97.

Institutional Investors Weigh In On CVD Equipment

Institutional investors and hedge funds have recently made changes to their positions in the business. Citadel Advisors LLC increased its holdings in CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after purchasing an additional 20,011 shares in the last quarter. DRW Securities LLC acquired a new stake in shares of CVD Equipment during the 4th quarter worth approximately $45,000. Finally, Dimensional Fund Advisors LP increased its stake in shares of CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after acquiring an additional 3,556 shares in the last quarter. Institutional investors own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.