CVD Equipment (NASDAQ:CVV) Shares Cross Above Two Hundred Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV)’s stock price crossed above its two hundred day moving average during trading on Wednesday . The stock has a two hundred day moving average of $3.64 and traded as high as $4.97. CVD Equipment shares last traded at $4.62, with a volume of 100,395 shares traded.

Analyst Ratings Changes

Separately, Weiss Ratings reaffirmed a “sell (e+)” rating on shares of CVD Equipment in a research note on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, CVD Equipment has a consensus rating of “Sell”.

CVD Equipment Trading Up 2.0%

The stock’s 50 day moving average is $4.20 and its 200 day moving average is $3.64. The stock has a market capitalization of $32.06 million, a price-to-earnings ratio of -230.88 and a beta of 1.01.

Institutional Inflows and Outflows

A number of hedge funds have recently modified their holdings of the business. DRW Securities LLC acquired a new position in shares of CVD Equipment during the 4th quarter worth approximately $45,000. Citadel Advisors LLC grew its holdings in CVD Equipment by 93.6% during the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after buying an additional 20,011 shares during the last quarter. Finally, Dimensional Fund Advisors LP grew its holdings in CVD Equipment by 5.2% during the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after buying an additional 3,556 shares during the last quarter. 31.59% of the stock is owned by hedge funds and other institutional investors.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.