CVD Equipment (NASDAQ:CVV) Upgraded to “Hold” at Wall Street Zen

CVD Equipment (NASDAQ:CVVGet Free Report) was upgraded by equities research analysts at Wall Street Zen to a “hold” rating in a report issued on Saturday.

Separately, Weiss Ratings reissued a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, According to data from MarketBeat.com, CVD Equipment presently has a consensus rating of “Sell”.

View Our Latest Stock Report on CVD Equipment

CVD Equipment Stock Performance

Shares of CVV stock opened at $3.34 on Friday. The firm has a market cap of $23.18 million, a price-to-earnings ratio of -166.92 and a beta of 1.01. CVD Equipment has a 52 week low of $2.46 and a 52 week high of $5.86. The firm’s 50-day simple moving average is $4.20 and its two-hundred day simple moving average is $3.68.

Hedge Funds Weigh In On CVD Equipment

Several hedge funds have recently made changes to their positions in the stock. DRW Securities LLC purchased a new position in shares of CVD Equipment during the 4th quarter valued at $45,000. Citadel Advisors LLC raised its position in shares of CVD Equipment by 93.6% in the third quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after buying an additional 20,011 shares in the last quarter. Finally, Dimensional Fund Advisors LP raised its position in shares of CVD Equipment by 5.2% in the third quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after buying an additional 3,556 shares in the last quarter. 31.59% of the stock is currently owned by hedge funds and other institutional investors.

CVD Equipment Company Profile

(Get Free Report)

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.

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