CVD Equipment (NASDAQ:CVV) Stock Crosses Above 200 Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV) crossed above its 200-day moving average during trading on Monday . The stock has a 200-day moving average of $3.88 and traded as high as $4.94. CVD Equipment shares last traded at $4.82, with a volume of 167,434 shares.

Analysts Set New Price Targets

Several research firms recently issued reports on CVV. Weiss Ratings reaffirmed a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. Wall Street Zen downgraded shares of CVD Equipment from a “hold” rating to a “sell” rating in a report on Saturday, April 4th. One equities research analyst has rated the stock with a Sell rating, According to MarketBeat.com, CVD Equipment has an average rating of “Sell”.

CVD Equipment Trading Up 10.3%

The business’s fifty day simple moving average is $4.12 and its two-hundred day simple moving average is $3.88. The stock has a market capitalization of $33.45 million, a P/E ratio of -21.91 and a beta of 0.95.

Hedge Funds Weigh In On CVD Equipment

A number of hedge funds have recently made changes to their positions in the business. Dimensional Fund Advisors LP raised its stake in shares of CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock valued at $241,000 after buying an additional 3,556 shares in the last quarter. Citadel Advisors LLC raised its stake in shares of CVD Equipment by 93.6% in the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock valued at $139,000 after buying an additional 20,011 shares in the last quarter. Finally, DRW Securities LLC acquired a new position in shares of CVD Equipment in the 4th quarter valued at $45,000. Institutional investors and hedge funds own 31.59% of the company’s stock.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.